Chiudi

Aggiungi l'articolo in

Chiudi
Aggiunto

L’articolo è stato aggiunto alla lista dei desideri

Chiudi

Crea nuova lista

Direct Copper Interconnection for Advanced Semiconductor Technology - cover
Direct Copper Interconnection for Advanced Semiconductor Technology - cover
Dati e Statistiche
Wishlist Salvato in 0 liste dei desideri
Direct Copper Interconnection for Advanced Semiconductor Technology
Disponibile in 5 giorni lavorativi
184,06 €
-5% 193,75 €
184,06 € 193,75 € -5%
Disp. in 5 gg lavorativi
Chiudi
Altri venditori
Prezzo e spese di spedizione
ibs
184,06 € Spedizione gratuita
disponibile in 5 giorni lavorativi disponibile in 5 giorni lavorativi
Info
Nuovo
Altri venditori
Prezzo e spese di spedizione
ibs
184,06 € Spedizione gratuita
disponibile in 5 giorni lavorativi disponibile in 5 giorni lavorativi
Info
Nuovo
Altri venditori
Prezzo e spese di spedizione
Chiudi

Tutti i formati ed edizioni

Chiudi
Direct Copper Interconnection for Advanced Semiconductor Technology - cover

Descrizione


In the “More than Moore” era, performance requirements for leading edge semiconductor devices are demanding extremely fine pitch interconnection in semiconductor packaging. Direct copper interconnection has emerged as the technology of choice in the semiconductor industry for fine pitch interconnection, with significant benefits for interconnect density and device performance. Low-temperature direct copper bonding, in particular, will become widely adopted for a broad range of highperformance semiconductor devices in the years to come. This book offers a comprehensive review and in-depth discussions of the key topics in this critical new technology. Chapter 1 reviews the evolution and the most recent advances in semiconductor packaging, leading to the requirement for extremely fine pitch interconnection, and Chapter 2 reviews different technologies for direct copper interconnection, with advantages and disadvantages for various applications. Chapter 3 offers an in-depth review of the hybrid bonding technology, outlining the critical processes and solutions. The area of materials for hybrid bonding is covered in Chapter 4, followed by several chapters that are focused on critical process steps and equipment for copper electrodeposition (Chapter 5), planarization (Chapter 6), wafer bonding (Chapter 7), and die bonding (Chapter 8). Aspects related to product applications are covered in Chapter 9 for design and Chapter 10 for thermal simulation. Finally, Chapter 11 covers reliability considerations and computer modeling for process and performance characterization, followed by the final chapter (Chapter 12) outlining the current and future applications of the hybrid bonding technology. Metrology and testing are also addressed throughout the chapters. Business, economic, and supply chain considerations are discussed as related to the product applications and manufacturing deployment of the technology, and the current status and future outlook as related to the various aspects of the ecosystem are outlined in the relevant chapters of the book. The book is aimed at academic and industry researchers as well as industry practitioners, and is intended to serve as a comprehensive source of the most up-to-date knowledge, and a review of the state-of-the art of the technology and applications, for direct copper interconnection and advanced semiconductor packaging in general.
Leggi di più Leggi di meno

Dettagli

2024
Hardback
448 p.
Testo in English
234 x 156 mm
1010 gr.
9781032528236
Chiudi
Aggiunto

L'articolo è stato aggiunto al carrello

Chiudi

Aggiungi l'articolo in

Chiudi
Aggiunto

L’articolo è stato aggiunto alla lista dei desideri

Chiudi

Crea nuova lista

Chiudi

Chiudi

Siamo spiacenti si è verificato un errore imprevisto, la preghiamo di riprovare.

Chiudi

Verrai avvisato via email sulle novità di Nome Autore